Some of these links may require Adobe Reader 6.0 or newer Increased interest has been shown in HIPIMS- HIGH POWER IMPULSE MAGNETRON SPUTTERING.  Both Huettinger Electronics and Gencoa are at the leading edge of this technology.  Read here how Gencoa's Speedflo for HIPIMS controls reactive processes.  A PPT style version of this information can be seen here.  For a brochure on Speedflo, click here.  A complete line of HIPIMS power supplies from Huettinger can be seen here. ___________________________________________ Granville-Phillips, A Division of Brooks Automation, has released a NEW ION TRAP FOR USE IN MASS SPECTROMETRY.  Read here how it works, and here how it compares to QMS. ___________________________________________ Brooks Automation, providers of CTI Cryogenics Cryopumps and Polycold PFC Water Vapor Pumps, provides an insightful white paper on GLOBAL REFRIGERANT COMPLIANCE.  Brooks Automation conforms worldwide to new standards, and explains not just what the standards are, but who is responsible for conforming, and how to check if your current vendor actually conforms.  A very important piece, read more here. ___________________________________________ LIQUID-TO-LIQUID HEAT EXCHANGERS can be used in certain applications, although many engineers assume a refrigerated system is necessary, or their only choice.  Liquid-to-liquid heat exchanger systems offer advantages, such as economy to purchase and run.  They also offer advantages over using building cooling water.  A recently published article by Tek-Temp Instruments covers various considerations, read more here. ___________________________________________ FEEDTHROUGH FUNDAMENTALS from Rigaku Vacuum Products explains how ferrofluidic rotary feedthroughs work, and tells how Rigaku has made meaningful improvements to the industry standard design.  Read more here. ___________________________________________ UNIFORMITY CONTROL IN REACTIVE MAGNETRON SPUTTERING is a paper provided by Gencoa of Liverpool, England, describing the benefits of plasma emission monitoring and closed loop feedback.  For more information, click here. ___________________________________________ NEW FEATURES OF DC P/S FOR MAGNETRON SPUTTERING describes Huettinger's arc management feature in detail, for more information, click here. ___________________________________________